Voltage Regulating Equipment Supplied In Denmark

These highly efficient ultra compact 24 VDC output power supplies operate directly from three-phase inputs and accommodate virtually all standard line voltages ...

Low-Frequency Series with Enhanced Arc Control and Internal Load Matching for 40 kHz Reactive Sputtering Applications. The PEII series of power supplies are the trusted standard for dual-magnetron sputtering, as an effective vacuum cleaning tool, and in multiple PECVD ...

An Arc-Bias Solution that Brings a New Level of Precision and Productivity to Cathodic Arc Processes. Solvix power supplies are specifically designed to enable advanced, high-tech ...

Asymmetric Bias Waveform Generator for Direct Control of Substrate Voltage and Ion Energy. Advanced Energy’s eVoS platform is a revolutionary power technology for the direct control of ion energy distribution in plasma processing. The integrated, single-enclosure system delivers a customized width and precise control of ion energy for node etch and deposition applications. ...

The MDX Series Enables Low-Power Magnetron Sputtering in a Small and Affordable Package. An industry workhorse, the MDX Series diligently serves low-power applications where robust, accurate power delivery is a ...

The Best in DC and Pulsed-DC Power Delivery Unify. A robust, coordinated suite of power generation specifically designed to enable advanced, high-tech ...