Yamato - Model PR200/300/301 - Gas Plasma Reactor
From Plasma Cleaner - Gas Plasma Reactor
Standard barrel type low temperature ashing devices suitable for a wide range of application such as ashing , etching and dry cleaning.
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Features
- Isotropy barrel type
- Compact, space saving design
- Capable of removing coated organic matter
- Adjustable RF suitable for various applications
- Outstanding operability and safety
- Can be set for a wide range of output conditions to handle a variety of testing samples
Application
- Functionalization of the polymeric material surface improves adhesion
- Oxidation reaction generates functional groups -OH, >C=O, -COOH on the surface (very small amount of water and carbon dioxide will impact)
- In nitrogen plasma, a nitrogen atom is incorporated onto the surface, generates a functional group -NH₂ Resist peeling
- Surface modification of materials (metals, polymers, films, ceramics, etc.)
- Asbestos pre-processing (ashing of membrane filter)
- Low-temperature ashing (polymer material, coal, food, etc.) PDMS chips bonding to glass and PDMS substrate
- Production of semiconductors and analysis work
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