Waste-To-Energy Equipment Supplied In Japan

Today, to manufacture high-resolution and high-performance displays, the TFT process must become more complex, and higher productivity is required for plasma etch systems. Betelex™ supports up to 5 process chambers and realize significantly higher productivity with smaller footprint and facility cost. Betelex™ can also combine multi-process steps in separated chambers and contribute a ...

TELINDY PLUS™ represents the convergence of demonstrated experience and leading edge thermal processing technology. TELINDY PLUS™ incorporates specialized features originally developed for short TAT (Turn Around Time) on the TELFORMULA™ minibatch system as well as field proven, high productivity design elements from the previous generation TELINDY™ platform. Process ...

With a unique user-insertable and removable quartz chamber liner, Advanced Energy's Rapid OX is optimal for oxygen-based ...

Achieve new levels of process performance using field-proven, bipolar DC pulsing ...

An Arc-Bias Solution that Brings a New Level of Precision and Productivity to Cathodic Arc Processes. Solvix power supplies are specifically designed to enable advanced, high-tech ...

A Compact, Economical, Easy to Install, Low Power RF Platform. Compact, lightweight, and air-cooled, HiLight™ RF generators are ideal for low-power, on-board applications, suiting 13.56 MHz plasma and 1 or 2 MHz ...

Advance your process development with a new focus on operating flexibility. Paramount® RF generators offer wide frequency and power ranges, support multiple integration scenarios, and are equipped with standard serial or analog interfaces. The Paramount platform’s digital architecture provides precise power management and streamlines new function integration — no lead times or ...

Get the broadest feature set available in a pulsed-RF product. The Paramount Plus offers precise RF regulation, sophisticated pulse manipulation, and advanced data acquisition. Designed to cover an extensive range of RF energy — frequencies of 400 kHz to 60 MHz and power levels of 1.5 to 15 kW — the Paramount Plus delivers the repeatability and reliability you ...

Need a highly efficient, compact, easy-to-integrate power source? The PDX® series provides extremely accurate, highly repeatable process control, helping to ensure process uniformity and high throughput. It’s wide frequency range of operation delivers optimal control across numerous applications. The PDX low-power (LP) series is available in 1250 W and 1400 W versions and the PDX ...

Low-Frequency Series with Enhanced Arc Control and Internal Load Matching for 40 kHz Reactive Sputtering Applications. The PEII series of power supplies are the trusted standard for dual-magnetron sputtering, as an effective vacuum cleaning tool, and in multiple PECVD ...

Remote Plasma Source and Power Delivery System that Enables Abatement of Exhaust Gasses. Litmas is an all-in-one remote plasma source combining the power supply, LitmasMatch™ matching network, and plasma chamber into one compact ...

Process-Proven, Pulsed DC for Single-Magnetron Reactive Sputtering of Thin Dielectric Films. Pinnacle Plus+ generators deliver DC power in a pulsing configuration enabling reactive sputtering of extremely uniform, high-quality dielectric films. Pinnacle Plus+ generators deliver DC power in a pulsing configuration enabling reactive sputtering of extremely uniform, high-quality dielectric ...

The MDX Series Enables Low-Power Magnetron Sputtering in a Small and Affordable Package. An industry workhorse, the MDX Series diligently serves low-power applications where robust, accurate power delivery is a ...

Unparalleled Breadth of RF-Application Delivery without Custom Lead Times. Robust and versatile, the Cesar platform provides excellent RF power delivery across a wide range of frequencies and power ...

The Navigator ll matching network’s advanced digital technology speeds tuning and match response ...

Tactras™ Vigus™ is a highly reliable 300mm plasma etch system that enhances etch process productivity. Scaling at advanced technology nodes makes the etch process more and more crucial. As the solution for etch process challenges, Tactras™ Vigus™ provides customized options for high aspect ratio holes, trench etch, mask and dielectric etch, and BEOL dielectric ...

Advanced Dual-Magnetron Sputtering Accessories. A field-proven solution for any dual-magnetron sputtering application with additional capabilities facilitating advanced process ...

Multi-Output Power System for Multi-Chamber Power Delivery in Solar PV Manufacturing. The Ascent MS supports up to five independent chambers of PERC PECVD deposition processes in a single unit. This optimizes power delivery, enables independent programming, and simplifies deposition machine design to help you lower capital costs and increase ...

Advanced Energy’s front-line DC generator provides performance and reliability required in dual-magnetron sputtering ...

The Most Recognized DC Power Supply for less than and equal to 20 kW Processes. Advanced Energy's Pinnacle DC generators enable quality thin films and maximum process ...